Crystallization of amorphous GeSi100− on SiO2
- 1 August 1981
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 82 (4) , 343-345
- https://doi.org/10.1016/0040-6090(81)90477-6
Abstract
No abstract availableThis publication has 2 references indexed in Scilit:
- High-dose Ge implantation into 〈100〉 SiNuclear Instruments and Methods, 1981
- Electrical conductivity and crystallization in amorphous germaniumJournal of Non-Crystalline Solids, 1977