CF4 plasma etching on LiNbO3
- 15 November 1979
- journal article
- conference paper
- Published by AIP Publishing in Applied Physics Letters
- Vol. 35 (10) , 756-758
- https://doi.org/10.1063/1.90959
Abstract
CF4 plasma etching was applied to LiNbO3. Ridge structures as thin as 3 μm were fabricated. The resolution was limited by photolithography Al masks. The etched surface showed an optical quality. A horn structure ridge channel wave guide of a width of 20 μm was also etched, and demonstrated good quality in guiding optical waves.Keywords
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