Water Vapour and Carbon Dioxide Diffusion Resistances of FourHevea brasiliensisClonal Seedlings
- 1 April 1978
- journal article
- research article
- Published by Cambridge University Press (CUP) in Experimental Agriculture
- Vol. 14 (2) , 173-177
- https://doi.org/10.1017/s0014479700008590
Abstract
Differences in the net photosynthetic rates of two classes of Hevea clonal seedlings are explained in terms of resistances to carbon dioxide diffusion from the outside air into the carboxylation sites. The residual resistance, the sum of the mesophyll and the carboxylation resistances, is apparently related to photosynthetic rates.This publication has 9 references indexed in Scilit:
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