What limits the application of TEM in the semiconductor industry?
- 1 May 1998
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 320 (1) , 77-85
- https://doi.org/10.1016/s0040-6090(97)01073-0
Abstract
No abstract availableThis publication has 1 reference indexed in Scilit:
- The preparation of cross‐section specimens for transmission electron microscopyJournal of Electron Microscopy Technique, 1984