Design and implementation of a real-time hierarchical parallel postprocessor for 100 keV electron beam lithography
- 1 November 1997
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 15 (6) , 2204-2208
- https://doi.org/10.1116/1.589614
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Efficiency of electron-beam proximity effect correctionJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1993
- Proximity correction using computer aided proximity correction (CAPROX): Evaluation and applicationJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1991