Real time controlled rf reactor for deposition of a-Si:H thin films
- 1 January 1989
- Vol. 39 (7-8) , 795-798
- https://doi.org/10.1016/0042-207x(89)90040-7
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- In situ optical characterizations for rf plasma deposited a-Si: H thin filmsVacuum, 1989
- Contamination effects in glow discharge deposition systemsJournal of Vacuum Science & Technology A, 1988
- Summary Abstract: Diagnostics in plasma processingJournal of Vacuum Science & Technology A, 1986
- Design of plasma etching and deposition systemsJournal of Vacuum Science & Technology A, 1986
- Optical properties of vacuum-evaporated CdTe thin filmsThin Solid Films, 1984