Polymers for 193-nm Microlithography: Regioregular 2-Alkoxycarbonylnortricyclene Polymers by Controlled Cyclopolymerization of Bulky Ester Derivatives of Norbornadiene
- 16 March 1998
- journal article
- Published by Wiley in Angewandte Chemie International Edition in English
- Vol. 37 (5) , 667-670
- https://doi.org/10.1002/(sici)1521-3773(19980316)37:5<667::aid-anie667>3.0.co;2-h
Abstract
No abstract availableKeywords
This publication has 0 references indexed in Scilit: