High Ion Density Plasma Etching of InGaP, AlInP, and AlGaP in CH 4 / H 2 / Ar

• 1 March 1996
• journal article
• Published by The Electrochemical Society in Journal of the Electrochemical Society
• Vol. 143  (3) , 1093-1098
• https://doi.org/10.1149/1.1836589

Abstract