Poly[γ‐methacryloyloxypropyltris(trimethylsiloxy)silane], or PMOTSS, is an intrinsically negative resist with a sensitivity comparable to that of the polyhalostyrenes. Although the homopolymer is rubbery, copolymers of MOTSS and halostyrenes are hard solids and are excellent candidates for use as the top, imaging layer of a bilayer resist for electron beam and masked ion‐beam lithography.