Analysis of pulse-time modulated high-density discharges
- 1 July 1996
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 14 (4) , 2122-2126
- https://doi.org/10.1116/1.580090
Abstract
Time modulation of the input power has been used recently to improve processing rates and etch selectivity in high-density discharges. Plasma characteristics of a pulse-time modulated high-density discharge is investigated here with the aid of a spatially averaged model. The model consists of mass and energy conservation equations for neutral and ionic species. Results are presented for chlorine and CF4 discharges for a range of pulse periods and duty ratios.Keywords
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