Copper Photodeposition on TiO2 Studied with HREM and EXAFS
- 1 October 1989
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 136 (10) , 2914-2923
- https://doi.org/10.1149/1.2096373
Abstract
The possibility of direct selective surface activation by photodeposition of autocatalytic Cu particles on photosensitive substrates in an alkaline electroless copper solution has been investigated. The nucleation and growth of particles were characterized by transmission electron microscopy (TEM). Ex situ high resolution TEM and in situ extended x‐ray absorption fine structure (EXAFS) spectroscopy were used to determine the oxidation state of photodeposited particles on thin polycrystalline films and suspended powders, respectively. It is shown that in the initial stages of photodeposition small (2+ ions, and Cu. From this it is concluded that under illumination Cu particles are only formed if deposition of is limited by either mass transport of complexed Cu2+ ions or kinetic factors.Keywords
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