Nucleation and growth of nanocrystalline silicon studied by TEM, XPS and ESR
- 1 June 2003
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 216 (1-4) , 376-381
- https://doi.org/10.1016/s0169-4332(03)00445-8
Abstract
No abstract availableThis publication has 15 references indexed in Scilit:
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