Diffusion of Atomic Oxygen in
- 19 October 1998
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 81 (16) , 3447-3450
- https://doi.org/10.1103/physrevlett.81.3447
Abstract
Density functional calculations using an α-quartz supercell as a model silica host identify the peroxy linkage as the lowest energy configuration of atomic O in Si, and find that its energy in this site and in interstitial molecular are nearly equal. Using ab initio molecular dynamics modified to converge to a saddle point, the barrier for concerted exchange of the peroxy linkage is found to be 1.3 eV. While O is generally believed to diffuse in molecular form in Si, measured diffusion activation energies are consistent with the peroxy exchange barrier.
Keywords
This publication has 32 references indexed in Scilit:
- Adaptive Riemannian Metric for Plane-Wave Electronic-Structure CalculationsEurophysics Letters, 1992
- The reaction of atomic oxygen with Si(100) and Si(111)Surface Science, 1992
- Empirical three-body potential for vitreous silicaThe Journal of Chemical Physics, 1988
- First-Principles Interatomic Potential of Silica Applied to Molecular DynamicsPhysical Review Letters, 1988
- Unified Approach for Molecular Dynamics and Density-Functional TheoryPhysical Review Letters, 1985
- Norm-Conserving PseudopotentialsPhysical Review Letters, 1979
- General Relationship for the Thermal Oxidation of SiliconJournal of Applied Physics, 1965
- Self-Consistent Equations Including Exchange and Correlation EffectsPhysical Review B, 1965
- Inhomogeneous Electron GasPhysical Review B, 1964
- THE ATOMIC ARRANGEMENT IN GLASSJournal of the American Chemical Society, 1932