A nano-composite resist system: A new approach to nanometer pattern fabrication
- 28 February 1997
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 35 (1-4) , 113-116
- https://doi.org/10.1016/s0167-9317(96)00167-0
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Si nanostructures fabricated by electron beam lithography combined with image reversal process using electron cyclotron resonance plasma oxidationJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1995
- Amorphous carbon films as resist masks with high reactive ion etching resistance for nanometer lithographyApplied Physics Letters, 1986