The Kinetics of Silicon Deposition on Silicon by Pyrolysis of Silane

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Abstract
The kinetics of silane pyrolysis on a silicon (111) surface has been investigated mass spectrometrically by molecular beam sampling over the silane pressure range Torr and specimen temperature range 20°–1200°C. Silane decomposition was found to occur by the mechanism where both the amount of adsorbed silane and decomposition rate depend linearly on silane pressure. The activation energy for decomposition was and the surface reaction efficiency (α) was found to obey the equation

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