New KrF and ArF excimer laser for advanced DUV lithography

• 28 February 1995
• journal article
• Published by Elsevier in Microelectronic Engineering
• Vol. 27  (1-4) , 221-224
• https://doi.org/10.1016/0167-9317(94)00093-a

Abstract

Keywords

• EXCIMER LASER
• KRF
• LITHOGRAPHY
• OPTIMIZED
• SPECTRAL
• DUV
• PURITY
• LASERTUBE