Observation of Single-Electron Charging in Double-Barrier Heterostructures
- 17 January 1992
- journal article
- other
- Published by American Association for the Advancement of Science (AAAS) in Science
- Vol. 255 (5042) , 313-315
- https://doi.org/10.1126/science.255.5042.313
Abstract
Incremental single-electron charging of size-quantized states has been observed in the well in submicrometer double-barrier resonant tunneling devices. In order to distinguish between the effects of size quantization and the single-electron charging, the heterostructure material was grown asymmetrical so that one barrier is substantially less transparent than the other. In the voltage polarity such that the emitter barrier is more transparent than the collector barrier, electrons accumulate in the well; incremental electron occupation of the well is accompanied by Coulomb blockade, which leads to sharp steps of the tunneling current. In the opposite voltage polarity the emitter barrier is less transparent than the collector barrier and the tunneling current reflects resonant tunneling through size-quantized well states.Keywords
This publication has 21 references indexed in Scilit:
- Magnetotunneling in a coupled two-dimensional–one-dimensional electron systemPhysical Review B, 1991
- Gated resonant tunnelling devicesElectronics Letters, 1991
- Coulomb blockade of resonant tunnelingPhysical Review B, 1990
- Comment on ‘‘Conductance oscillations periodic in the density of a one-dimensional electron gas’’Physical Review Letters, 1989
- Conductance Oscillations Periodic in the Density of a One-Dimensional Electron GasPhysical Review Letters, 1989
- Breakdown of coherence in resonant tunneling through double-barrier heterostructuresSolid-State Electronics, 1988
- Electronic structure of ultrasmall quantum-well boxesPhysical Review Letters, 1987
- Observation of the incremental charging of Ag particles by single electronsPhysical Review Letters, 1987
- Optical spectroscopy of ultrasmall structures etched from quantum wellsApplied Physics Letters, 1986
- A possible explanation of the increase of the electrical resistance of thin metal films at low temperatures and small field strengthsPhysica, 1951