Characterization of multicusp-plasma ion source brightness using micron-scale apertures
- 1 November 2001
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 19 (6) , 2602-2606
- https://doi.org/10.1116/1.1414019
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
- Pattern generators and microcolumns for ion beam lithographyJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2000
- Atomic Structure and Electrical Properties of a Supertip Gas Field-Ion SourceMaterials Science Forum, 1997
- Electron beam technology—SEM to microcolumnMicroelectronic Engineering, 1996
- Negative electron affinity photocathodes as high-performance electron sources. Part 1: achievement of ultrahigh brightness from an NEA photocathodePublished by SPIE-Intl Soc Optical Eng ,1995
- Masked ion-beam lithography: A feasibility demonstration for submicrometer device fabricationJournal of Vacuum Science and Technology, 1981
- 400-Å high aspect-ratio lines produced in poylmethyl methacrylate (PMMA) by ion-beam exposureApplied Physics Letters, 1979