Beitrag zur Verteilung von Kupfer und Gold in tiegelfrei gezogenen Siliziumkristallen
- 1 January 1967
- journal article
- research article
- Published by Wiley in Crystal Research and Technology
- Vol. 2 (3) , 415-418
- https://doi.org/10.1002/crat.19670020312
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- Radiochemische untersuchungen zur diffusion von gold in siliziumSolid-State Electronics, 1966
- Neuere Ergebnisse der Halbleiterforschung und ‐entwicklungChemie Ingenieur Technik - CIT, 1965
- Diffusion of Gold into Silicon CrystalsJournal of the Electrochemical Society, 1965
- Mechanism of Gold Diffusion into SiliconJournal of Applied Physics, 1964
- Properties of Silicon Doped with Iron or CopperPhysical Review B, 1957
- Solubility and Diffusivity of Gold, Iron, and Copper in SiliconJournal of Applied Physics, 1956
- Mobility of Impurity Ions in Germanium and SiliconPhysical Review B, 1954