Experimental results from fast electron pattern generator: A variable shaped beam machine
- 1 January 1986
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B
- Vol. 4 (1) , 73-77
- https://doi.org/10.1116/1.583397
Abstract
Fast electron pattern generator (FEPG) is a variable shaped beam lithographic system specially designed for direct writing on wafers and for mask fabrication. Experimental results are given: gold gratings on silicon patterned with 10×0.3 μm spots, 1 μm gate field‐effect transistor (FET), masks 1×. All these results performed with a 5 A/cm2 current density are consistent with a 1 μm technology. When the spot current exceeds 5 A/cm2, defects due to the space charge effect appear. Thermal effects on glass substrates are pointed out.Keywords
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