Thermal Oxidation of Tungsten‐Based Sputtered Coatings
- 1 January 1997
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 144 (1) , 259-266
- https://doi.org/10.1149/1.1837394
Abstract
The effect of the addition of nickel, titanium, and nitrogen on the air oxidation behavior of W‐based sputtered coatings in the temperature range 600 to 800°C was studied. In some cases these additions significantly improved the oxidation resistance of the tungsten coatings. As reported for bulk tungsten, all the coatings studied were oxidized by layers following a parabolic law. Besides and phases detected in all the oxidized coatings, and were also detected for W‐Ti and W‐Ni films, respectively. was present as an inner protective compact layer covered by the porous oxide. The best oxidation resistance was found for W‐Ti and W‐N‐Ni coatings which also presented the highest activation energies ( and 218 kJ mol−1 respectively, as opposed to for the other coatings). These lower oxidation weight gains were attributed to the greater difficulty of the inward diffusion of oxygen ions for W‐Ti films, owing to the formation of fine particles of , and the formation of the external, more protective layer of for W‐N‐Ni coatings.Keywords
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