Low-temperature (<450 °C), plasma-assisted deposition of poly-Si thin films on SiO2 and glass through interface engineering
- 1 May 1997
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 15 (3) , 1035-1040
- https://doi.org/10.1116/1.580426
Abstract
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