High quality a-Si film produced by horizontal plasma furnace
- 1 December 1983
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 59-60, 755-758
- https://doi.org/10.1016/0022-3093(83)90281-8
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Mobility-lifetime product and interface property in amorphous silicon solar cellsJournal of Applied Physics, 1983
- Determination of the Built-in Potential in a-Si Solar Cells by Means of Electroabsorption MethodJapanese Journal of Applied Physics, 1982
- Optimization of GD a-Si: H Film Property for Photovoltaic Device by Means of the Cross Field Plasma Deposition TechniqueJapanese Journal of Applied Physics, 1982
- Device physics and design of a-Si ITO/p-i-n heteroface solar cellsSolar Energy Materials, 1980
- Effect of DC electric field on the basic properties of RF plasma deposited a-SiJournal of Non-Crystalline Solids, 1980