Abstract
Optical properties of plasma-deposited amorphous hydrogenated carbon films were studied by spectroscopic ellipsometry. From the ellipsometry data, the real and imaginary parts,nandk, of the complex index of refraction of the film have been deduced for photon energies between 2.0 and 4.0 eV for as-grown as well as for thermally annealed films. Herenandkshowed considerable variation with subsequent annealing, even under 400°C. A tentative explanation of the results is proposed.