Submicron patterns formed by reactive ion etching
- 1 December 1985
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 3 (1) , 467-473
- https://doi.org/10.1016/0167-9317(85)90058-9
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- High resolution, steep profile resist patternsJournal of Vacuum Science and Technology, 1979