Pyrometric Emissivity Measurements and Compensation in an RTP Chamber
- 1 January 1989
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
The emissivity effects and compensation schemes encountered in pyrometric temperature measurements in RTP systems are described in this paper. The emissivity effects include substrate roughness, layered films, substrate temperature, and chamber reflectivity. Compensation techniques are derived based on the emissivity effects, and include reference thermocouples and reflectance-based measurements. Compensated emissivity results in wafer-to-wafer temperature variations of less than ± 6 C, compared to as much as ± 100 C for uncompensated emissivity. A new model for emissivity analysis at temperatures larger than 700 C is also described.Keywords
This publication has 2 references indexed in Scilit:
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- Thermal Radiation from Partially Transparent Reflecting BodiesJournal of the Optical Society of America, 1950