The synthesis and lithographic evaluation of a new organosilicon novolac-based resist

• 1 November 1988
• journal article
• research article
• Published by Wiley in Journal of Polymer Science Part A: Polymer Chemistry
• Vol. 26  (12) , 3173-3187
• https://doi.org/10.1002/pola.1988.080261205

Abstract

Keywords

• RESORCINOL
• ETCHING
• BILEVEL
• LITHOGRAPHIC
• RESIST
• SILICON CONTENT
• ELECTRON BEAM
• MATERIALS