Ideally Ordered Anodic Porous Alumina Mask Prepared by Imprinting of Vacuum-Evaporated Al on Si
- 1 November 2001
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 40 (11B) , L1267
- https://doi.org/10.1143/jjap.40.l1267
Abstract
Application of imprinting of vacuum-evaporated Al on a Si substrate using an SiC mold with an ordered array of hexagonally arranged convexes and subsequent anodization yielded an ideally ordered porous alumina mask on the substrate. The obtained alumina mask has sufficient adhesion to a Si substrate, and was used as a mask for vacuum evaporation of metal and ion milling of the Si substrate.Keywords
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