Process control with optical emission spectroscopy in triode ion plating

• 1 November 1985
• journal article
• Published by American Vacuum Society in Journal of Vacuum Science & Technology A
• Vol. 3  (6) , 2364-2367
• https://doi.org/10.1116/1.572882

Abstract

Keywords

• CHEMICAL COMPOSITION
• SPECTROSCOPY
• STOICHIOMETRY
• NITROGEN
• EVAPORATION
• MATERIALS SCIENCE
• CONTROL SYSTEMS
• EMISSION SPECTROSCOPY
• FLUID FLOW
• EMISSION LINE
• NITRIDES
• PHYSICAL VAPOR DEPOSITION
• TITANIUM
• CONTROL SYSTEM
• DEPOSITION
• IONIZATION
• PROCESS CONTROL
• SPUTTERING