Reactive ion etching of polyimide for multi-level resist and contact hole applications
- 1 December 1985
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 3 (1-4) , 491-498
- https://doi.org/10.1016/0167-9317(85)90061-9
Abstract
No abstract availableThis publication has 1 reference indexed in Scilit:
- High resolution trilevel resistJournal of Vacuum Science and Technology, 1982