Image Reversal Of Positive Photoresist A New Tool For Advancing Integrated Circuit Fabrication

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Abstract
In the struggle to attain denser and higher speed devices through reducing feature sizes companies are facing thresholds beyond which conventional photolithography cannot transcend. Enormous financial commitments have been made by semiconductor device fabricators in their drive to produce devices centered on 1.5μ design rules. The purchase of ever more sophisticated alignment and peripheral processing equipment, costly photoresist changes, and massive investments in engineering has enabled many companies to participate in this race. This compulsory buying of next year's model will not necessarily bring companies through the difficult technological times ahead!© (1985) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.

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