A comparison of focused ion beam and electron beam induced deposition processes
- 1 November 1996
- journal article
- Published by Elsevier in Microelectronics Reliability
- Vol. 36 (11) , 1779-1782
- https://doi.org/10.1016/0026-2714(96)00196-5
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Local material removal by focused ion beam milling and etchingNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1995
- Three-dimensional structurization by additive lithography, analysis of deposits using TEM and EDX, and application to field-emitter tipsMicroelectronic Engineering, 1994
- Catalytic growth rate enhancement of electron beam deposited iron filmsApplied Physics Letters, 1987