Planar magnetron sputtering of a-Si:H and a-Ge:H thin films

• 1 April 1984
• journal article
• Published by American Vacuum Society in Journal of Vacuum Science & Technology A
• Vol. 2  (2) , 326-329
• https://doi.org/10.1116/1.572593

Abstract

Keywords

• MAGNETRON SPUTTERING
• INFRARED
• DETECTION LIMIT
• THIN FILM
• SYSTEM ENGINEERING
• AUGER ELECTRON SPECTROSCOPY
• OPTIMAL CONTROL
• CRYSTAL GROWTH
• INFRARED SPECTROSCOPY