Selective deposition of thin films by substrate argon ion bombardment
- 1 October 1988
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 164, 475-480
- https://doi.org/10.1016/0040-6090(88)90179-4
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Selective deposition of Ti: An interface studyJournal of Vacuum Science & Technology A, 1987
- Ion assisted selective thin film depositionJournal of Vacuum Science & Technology A, 1986
- Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline TargetsPhysical Review B, 1969