Novel toroidal mirror enhances x-ray lithography beamline at the Center for X-ray Lithography

Publisher Website
Google Scholar
Abstract
An unique lithography beamline is described that delivers x-rays using a flexible arrangement of two toroidal mirrors providing high spectral and spatial uniformity at the wafer plane. The image produced is a thin, scannable, horizontal line suitable for exposing a 25 nm X 50 nm field, compatible with submicron ULSI. The authors also present the current status of such a beamline currently under construction at CXrL for use with the Silicon Valley Group Lithography, Inc.'s 0.25 micron x-ray stepper.

This publication has 0 references indexed in Scilit: