Novel ArF Excimer Laser Resists Based on Menthyl Methacrylate Terpolymer.

• 1 January 1996
• journal article
• Published by Technical Association of Photopolymers, Japan in Journal of Photopolymer Science and Technology
• Vol. 9  (3) , 457-464
• https://doi.org/10.2494/photopolymer.9.457

Abstract

Keywords

• NOVEL ARF
• LASER RESISTS
• METHACRYLATE TERPOLYMER
• MENTHYL METHACRYLATE
• ARF EXCIMER