Silicon Oxynitride Films on Fused Silica for Optical Waveguides
- 1 November 1972
- journal article
- Published by Optica Publishing Group in Applied Optics
- Vol. 11 (11) , 2482-8
- https://doi.org/10.1364/ao.11.002482
Abstract
We have evaluated chemical vapor-deposited silicon oxynitride films on fused silica as a potential integrated optics medium. Refractive index of these glassy films depends on composition, which is adjusted by controlling the ratio of the nitric oxide and silane reactants. Films of n = 1.48-1.54 had losses <0.4 dB/cm at 633 nm. The preparation of the fused silica substrate surface and other precautions to minimize scattering centers ape discussed.Keywords
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