Amplitude mask patterned on an excimer laser mirrorfor high intensity writing of long period fibre gratings
- 19 June 1997
- journal article
- Published by Institution of Engineering and Technology (IET) in Electronics Letters
- Vol. 33 (13) , 1167-1168
- https://doi.org/10.1049/el:19970780
Abstract
Masks have been produced for long period fibre grating fabrication from commercial dielectric laser mirrors. The masks, which were produced by direct patterning of a photoresist using an argon laser, can withstand in excess of 200 mJ/cm2 per 15 ns pulse of 248 nm laser light. The use of these masks decreased exposure times by 90% and nearly doubled the attenuation (dB) of a long period grating produced by a given UV fluence compared to chrome-on-silica masks.Keywords
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