Fully methylated, atomically flat (111) silicon surface
- 1 January 2000
- journal article
- research article
- Published by Elsevier in Surface Science
- Vol. 444 (1-3) , L7-L10
- https://doi.org/10.1016/s0039-6028(99)01065-1
Abstract
No abstract availableThis publication has 15 references indexed in Scilit:
- Lewis Acid Mediated Functionalization of Porous Silicon with Substituted Alkenes and AlkynesJournal of the American Chemical Society, 1998
- Determination of the bonding of alkyl monolayers to the Si(111) surface using chemical-shift, scanned-energy photoelectron diffractionApplied Physics Letters, 1997
- Bonding Organic Molecules to Hydrogen‐Terminated Silicon WafersJournal of the Electrochemical Society, 1997
- Electrochemical Formation of Close-Packed Phenyl Layers on Si(111)The Journal of Physical Chemistry B, 1997
- Alkylation of Si Surfaces Using a Two-Step Halogenation/Grignard RouteJournal of the American Chemical Society, 1996
- Light-Induced Reactions of Porous and Single-Crystal Si Surfaces with Carboxylic AcidsJournal of the American Chemical Society, 1996
- Electrochemical Methoxylation of Porous Silicon SurfaceJournal of the Electrochemical Society, 1995
- Alkyl Monolayers on Silicon Prepared from 1-Alkenes and Hydrogen-Terminated SiliconJournal of the American Chemical Society, 1995
- Self‐assembled monolayers of alkyltrichiorosilanes: Building blocks for future organic materialsAdvanced Materials, 1990
- Ideal hydrogen termination of the Si (111) surfaceApplied Physics Letters, 1990