A critique of a recent thin-film field-effect experiment using detached electrodes
- 15 April 1974
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 24 (8) , 354-355
- https://doi.org/10.1063/1.1655213
Abstract
As a result of a study of the dc electric field effect on vapor‐deposited metal films using electrodes detached from the substrate, Murr and Singh recently observed no significant effects for fields applied in the plane of the substrate, ranging from 10 to 103 V/cm. It is demonstrated in the present paper that a linear gradient did not exist during these experiments, and that due to a counteracting influence of the displacement current, the potential gradient at the substrate surface probably approached zero almost instantaneously at elevated substrate temperatures. An analysis of the field conditions attendant to thin‐film field‐effect experiments with detached electrodes indicates that the effect of dc electric fields on nucleation and growth of vapor‐deposited thin films in such an experiment can only be established when the substrate temperature is relatively low.Keywords
This publication has 3 references indexed in Scilit:
- Significance of Electric Fields on the Growth of Thin Metal FilmsApplied Physics Letters, 1972
- The Influence of Charge Effects on the Growth and Electrical Resistivity of Thin Metal FilmsJournal of Applied Physics, 1967
- The Concentration and Mobility of Vacancies in Sodium ChlorideThe Journal of Chemical Physics, 1950