Low-stress tantalum absorbers deposited by sputtering for x-ray masks

• 1 November 1989
• journal article
• Published by American Vacuum Society in Journal of Vacuum Science & Technology B
• Vol. 7  (6) , 1680-1683
• https://doi.org/10.1116/1.584481

Abstract

Keywords

• LOW STRESS
• ABSORBERS DEPOSITED
• RAY MASKS
• SPUTTERING
• STRESS TANTALUM ABSORBERS