A novel plasma jet for GeHx-radical generation and a-Ge:H-film deposition
- 1 January 1991
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 137-138, 745-748
- https://doi.org/10.1016/s0022-3093(05)80228-5
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
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- A model for the discharge kinetics and plasma chemistry during plasma enhanced chemical vapor deposition of amorphous siliconJournal of Applied Physics, 1988
- Amorphous silicon deposition rates in diode and triode dischargesJournal of Applied Physics, 1986