Modelling of anisotropic etching in silicon-based sensor application
- 31 May 1992
- journal article
- Published by Elsevier in Sensors and Actuators A: Physical
- Vol. 33 (1-2) , 103-105
- https://doi.org/10.1016/0924-4247(92)80237-w
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Anisotropic Etching of Crystalline Silicon in Alkaline Solutions: II . Influence of DopantsJournal of the Electrochemical Society, 1990
- Micro-machining: A survey of the most commonly used processesSensors and Actuators, 1989
- Use of Modified Free Energy Theorems to Predict Equilibrium Growing and Etching ShapesJournal of Applied Physics, 1962