A Monte Carlo code including an X-ray characteristic fluorescence correction for electron probe microanalysis of a thin film on a substrate
- 14 October 1982
- journal article
- Published by IOP Publishing in Journal of Physics D: Applied Physics
- Vol. 15 (10) , L121-L124
- https://doi.org/10.1088/0022-3727/15/10/001
Abstract
The characteristic fluorescence correction has been taken into account in the authors Monte Carlo program for the case of a film fluorescing under X-ray emission from the substrate. The effect is evaluated for Al on Si, at electron energies of 10, 20 and 30 keV and thicknesses ranging up to 0.6 mg cm-2. In the particular limit of zero thickness the correction is in agreement with the analytical model by Cox et al. (1979).Keywords
This publication has 1 reference indexed in Scilit:
- Application of Monte Carlo technique to the electron probe microanalysis of ternary Si-B-O films on siliconJournal of Physics D: Applied Physics, 1979