Potential applications of a new microwave ECR multicusp plasma ion source
- 1 May 1991
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 56-57, 1166-1170
- https://doi.org/10.1016/0168-583x(91)95122-t
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Potential applications of an electron cyclotron resonance multicusp plasma sourceJournal of Vacuum Science & Technology A, 1990
- Technology and applications of broad-beam ion sources used in sputtering. Part I. Ion source technologyJournal of Vacuum Science and Technology, 1982
- 15 cm duoPIGatron ion sourceReview of Scientific Instruments, 1977