Lithography simulation with aerial image — Variable threshold resist model
- 1 May 1999
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 46 (1-4) , 59-63
- https://doi.org/10.1016/s0167-9317(99)00015-5
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Experimental results on optical proximity correction with variable-threshold resist modelPublished by SPIE-Intl Soc Optical Eng ,1997
- Mathematical and CAD framework for proximity correctionPublished by SPIE-Intl Soc Optical Eng ,1996