Dependence of ZnO films on sputtering parameters and saw device on ZnO/InP
- 1 August 1989
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 96 (4) , 785-789
- https://doi.org/10.1016/0022-0248(89)90637-4
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Effect of r.f. sputtering parameters on ZnO films deposited onto GaAs substratesThin Solid Films, 1987
- Strictly nonblocking 8×8 integrated optical switch matrixElectronics Letters, 1986
- Integrated optic devices for coherent transmissionJournal of Lightwave Technology, 1986
- Architectures for large nonblocking optical space switchesIEEE Journal of Quantum Electronics, 1986
- Wide-band guided-wave acoustooptic Bragg cells in GaAs-GaAlAs waveguideIEEE Journal of Quantum Electronics, 1986
- Optical-gyroscope application of efficient crossed-channel acoustooptic devicesApplied Physics B Laser and Optics, 1984