Electron beam defined surface gratings in AlGaAs with precisely controlled duty cycle using a multiple line exposure technique

Abstract
We describe the fabrication of surface gratings in AlGaAs with precise control of duty cycle using a multiple line electron beam exposure technique. Using the electron beam resist as an etch mask for the subsequent chemically assisted ion beametching, we have fabricated near ideal rectangular gratings with a periodicity of 290 nm and a duty cycle ranging from 34% to 73%. The duty cycle is conveniently controlled by utilizing the linear dependence of the duty cycle on the line spacing during the electron beam exposure.

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