Comparison of techniques to characterise the density, porosity and elastic modulus of porous low-k SiO2 xerogel films
- 31 January 2002
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 60 (1-2) , 133-141
- https://doi.org/10.1016/s0167-9317(01)00589-5
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Determination of pore size distribution in thin films by ellipsometric porosimetryJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2000
- Properties of nanoporous silica thin films determined by high-resolution x-ray reflectivity and small-angle neutron scatteringJournal of Applied Physics, 2000
- Nanoporous Silica as an Ultralow-k DielectricMRS Bulletin, 1997
- Fluorine atom induced decreases to the contribution of infrared vibrations to the static dielectric constant of Si–O–F alloy filmsJournal of Vacuum Science & Technology A, 1997