The mechanism of photocure of inherently photosensitive polyimides containing a benzophenone group
- 1 August 1989
- journal article
- research article
- Published by Wiley in Polymer Engineering & Science
- Vol. 29 (14) , 942-944
- https://doi.org/10.1002/pen.760291411
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Photochemistry of a benzophenone-containing bisimide: a model for inherently photosensitive polyimidesJournal of Photochemistry and Photobiology A: Chemistry, 1988
- On the crosslinking mechanism of benzophenone-containing polyimidesMacromolecules, 1988
- Substituent effects on hydrogen abstraction by phenyl ketone tripletsJournal of the American Chemical Society, 1985